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The worldwide VLSI lithography technology was reviewed, including such techniques as photolithography, electron beam lithography, ion beam lithography and X-ray lithography. The advantages and disadvantages of these techniques were compared with each other, while the feasibility of their application in VLSI production was stated. The development trend of VLSI lithography technology for further microfabrication was described.

Type

Journal article

Journal

Tien Tzu Hsueh Pao/Acta Electronica Sinica

Publication Date

01/11/1995

Volume

23

Pages

1 - 7