New method for optical proximity correction with gray level serifs
Du J., Huang Q., Guo Y., Cui Z.
Based on analysis of physical mechanics on optical proximity effect, we present a new method for fine correction of optical proximity effect and point out that the optimum of amplitude distribution on mask can improve distribution of spatial frequency spectrum, so intensity distribution of printed image near ideal distribution can be obtained. The simulation results show that deviation between contour of image after OPC and contour of ideal image is less than 0.009. ©2003 Copyright SPIE - The International Society for Optical Engineering.