Cookies on this website
We use cookies to ensure that we give you the best experience on our website. If you click 'Continue' we'll assume that you are happy to receive all cookies and you won't see this message again. Click 'Find out more' for information on how to change your cookie settings.

A Monte Carlo program suite MOCASEL has been developed for 3-D simulation of e-beam lithography over a flat or a topographical substrate. A new "electron cloud" scheme is introduced to reduce the number of electrons used in the simulation, which results in a considerable reduction of computation time. Electron trajectories over substrate topography of single or composite materials are presented. 3-D resist profiles on a flat substrate and on a topographical substrate are compared. The line "swelling" effect due to electron forward scattering from a topography is revealed.

Original publication

DOI

10.1016/S0167-9317(98)00039-2

Type

Journal article

Journal

Microelectronic Engineering

Publication Date

01/01/1998

Volume

41-42

Pages

175 - 178