Fractional Fourier domain filtering applied to improve image quality in photolithography
Zhang Y., Du J., Yang J., Zeng Y., Guo Y., Cui Z., Yao J.
In this paper, we present a new method to improve the image quality and resolution of photolithography by filtering in fractional Fourier domain. Introducing a filter into fractional Fourier domain can not only increase the flexibility of the filtering operation, but also enhance the image quality and the depth of focus in photolithography. The corresponding simulation results are illustrated.