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We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The temperature dependence of the imprinted depth was investigated. The SU-8 gratings were well resolved with high density, good uniformity and high aspect ratio. This was achieved at low temperature and low pressure. Some issues and possible solutions are discussed. The process should find broader applications such as in the manufacture of nanofluidic channels and nanophotonic structures. © 2007 Elsevier B.V. All rights reserved.

Original publication

DOI

10.1016/j.mee.2007.01.027

Type

Journal article

Journal

Microelectronic Engineering

Publication Date

01/05/2007

Volume

84

Pages

872 - 876