Magnetoresistance in thin Permalloy film (10 nm thick and 30-200 nm wide) nanocontacts fabricated by e-beam lithography
García N., Hao C., Yonghua L., Muñoz M., Chen Y., Cui Z., Lu Z., Zhou Y., Pan G., Pasa AA.
In this letter the authors show spin dependent transport experiments in nanoconstrictions ranging from 30 to 200 nm. These nanoconstrictions were fabricated by combined electron-beam lithography and thin film deposition techniques. Two types of geometries have been fabricated and investigated. They compare the experimental results with the theoretical estimation of the electrical resistance. Finally they show that the magnetoresistance for the different geometries does not scale with the resistance of the structure and obtain drops in voltage of 20 mV at 20 Oe. © 2006 American Institute of Physics.