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Digital-multi-micromirror device (DMD)-based photolithography technique is a promising tool for the fabrication of microstructure. In this paper an imaging model was developed for describing its complicated imaging process, and then the fabrication processes of some typical diffractive optical elements (DOEs) were simulated. The simulated results demonstrate that the DMD-based lithography technique allows to realize a wide variety of microoptical elements, e.g., Dammann grating, Fresnel lens, beam shaping element or refractive microstructures. © 2006 Elsevier B.V. All rights reserved.

Original publication

DOI

10.1016/j.mee.2006.01.100

Type

Journal article

Journal

Microelectronic Engineering

Publication Date

01/04/2006

Volume

83

Pages

1012 - 1016