Cookies on this website

We use cookies to ensure that we give you the best experience on our website. If you click 'Accept all cookies' we'll assume that you are happy to receive all cookies and you won't see this message again. If you click 'Reject all non-essential cookies' only necessary cookies providing core functionality such as security, network management, and accessibility will be enabled. Click 'Find out more' for information on how to change your cookie settings.

Pattern placement error (or pattern distortion) caused by different thermal expansions between templates and substrates in nanoimprint lithography is experimentally investigated. Using fabricated nanorulers, placement errors are quantitatively measured. Our results prove that nanoimprint lithography (NIL) with a heat cycle does have considerable error of pattern placement. But that is not the case with imprints at room temperature. This indicates that low-temperature or room-temperature imprints Should be effective Solutions. © 2006 Society of Photo-Optical Instrumentation Engineers.

Original publication




Journal article


Journal of Microlithography, Microfabrication and Microsystems

Publication Date