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A new method is proposed to design gray-tone masks for fabrication of surface relief microstructures. Unlike previous methods which modulate the light intensity by changing the cell size or cell pitch only, the method relays on adjusting both the shape and position of a cell which gives an extra freedom to control the design accuracy. Using the new method a gray-tone mask has been designed to produce a hemispherical shape relief structure. Based on the theory of partial coherent light and the resist development model, the intensity distribution through the gray-tone mask and exposure of photoresist have been simulated. Nonlinear effects in aerial image and resist development have been take into account to correct the mask design. The accuracy of the gray-tone mask design has been confirmed by simulation of 3D resist profiles.

Type

Journal article

Journal

Proceedings of SPIE - The International Society for Optical Engineering

Publication Date

01/01/1999

Volume

3680

Pages

879 - 886