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A comparative study of high resolution positive imaging obtained after liquid-phase silylation and dry development with two commercial and one experimental electron-beam chemically amplified resists (CARs), namely SAL601, AZPN114, and EPR (EPoxidised Resist) is presented. 150 nm lines and spaces are obtained for all resists, while 100nm lines are achieved with AZPN114 and EPR at 50kV exposures. The exposure doses for AZPN114 and SAL601 are 10 μC/cm2 and 20 μC/cm2, respectively, while EPR is considerably faster (1.5 μC/cm2). Chlorosilanes are used for EPR silylation, while SAL601 and AZPN114 are silylated with hexamethyl cyclo tri silazane (HMCTS) or bis (di methyl amino) di silane (B(DMA)DS). SAL601 shows less silylation selectivity between exposed and unexposed areas possibly due to insufficient crosslinking. Implications of the presented processes on low-energy electron-beam lithography are discussed. © 1998 Publication Board, Japanese Journal of Applied Physics.


Journal article


Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Publication Date





6873 - 6876