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Based on the view of wave-front processing for photolithography and the thought of improving light intensity distribution on image, a new optical proximity correction method with adding subresolution bright and dark serifs in the mask was proposed. The rule of adding the serifs was discussed in detail. The computer simulation and analysis show that this new method not only has good correction result but has the advantages of convenient, flexible, effective and practical.

Type

Journal article

Journal

Yingyong Jiguang/Applied Laser Technology

Publication Date

01/12/1997

Volume

17

Pages

244 - 243