Cookies on this website
We use cookies to ensure that we give you the best experience on our website. If you click 'Continue' we'll assume that you are happy to receive all cookies and you won't see this message again. Click 'Find out more' for information on how to change your cookie settings.

A new method with coding grey-tone mask has been developed to fabricate multifunction diffractive structures. Instead of conducting two different lithography processes to produce multifunction diffractive structures on a substrate, the new method achieves such structures through one-step lithography using a grey-tone mask. Considering the nonlinear nature of aerial image formation and resist development, predistortion is introduced to encode the grey-tone mask. Based on the theory of partial coherent light and resist development model, the intensity distribution through the grey-tone mask and exposure of photoresist have been simulated. The simulated 3D photoresist profiles are in agreement with the intended multifunction diffractive structures. © 2002 Elsevier Science B.V. All rights reserved.

Original publication

DOI

10.1016/S0167-9317(02)00527-0

Type

Conference paper

Publication Date

01/07/2002

Volume

61-62

Pages

165 - 171