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A new method with coding grey-tone mask has been developed to fabricate multifunction diffractive structures. Instead of conducting two different lithography processes to produce multifunction diffractive structures on a substrate, the new method achieves such structures through one-step lithography using a grey-tone mask. Considering the nonlinear nature of aerial image formation and resist development, predistortion is introduced to encode the grey-tone mask. Based on the theory of partial coherent light and resist development model, the intensity distribution through the grey-tone mask and exposure of photoresist have been simulated. The simulated 3D photoresist profiles are in agreement with the intended multifunction diffractive structures. © 2002 Elsevier Science B.V. All rights reserved.

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Conference paper

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165 - 171