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A simple and inexpensive method has been applied to the determination of transmission and phase shifting of fully embedded phase shift masks. The method is based on the measurement of reflectance and transmittance (R-T) of the embedded layer. A 3-mirror reflection system has been developed to carry out the R-T measurement and a computer program has been written to calculate the real and imaginary components of refractive index (n, k), and hence the phase shifting and attenuating properties, of an embedded layer. The effectiveness and accuracy of the R-T method has been confirmed by experiment.

Original publication

DOI

10.1016/0167-9317(95)00214-6

Type

Journal article

Journal

Microelectronic Engineering

Publication Date

01/01/1996

Volume

30

Pages

145 - 148