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Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost. © 2005 Elsevier B.V. All rights reserved.

Original publication

DOI

10.1016/j.mee.2004.12.078

Type

Conference paper

Publication Date

01/03/2005

Volume

78-79

Pages

612 - 617