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This paper proposes a two-step electron beam lithography process, i.e., exposing feet and heads in two separate steps for ultra-short T gates, using a PMMA/UNIII resist stack separated by a thin lift off resist (LOR) layer. Results from both experiments and Monte Carlo simulations show that the two-step lithography process has advantages over the traditional one-step process of being able to pattern shorter feet with a much thicker top layer. The optimum thickness of the LOR for patterning T shape profiles in the PMMA/UVIII resist stack has been found to be about 20 nm. © 2004 Elsevier B.V. All rights reserved.

Original publication

DOI

10.1016/S0167-9317(04)00178-9

Type

Conference paper

Publication Date

01/01/2004

Volume

73-74

Pages

662 - 665