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Generally, a laser direct writing lithography system can only produce feature sizes larger than its beam spot size. When the feature size is comparable to its spot size, corner rounding and line shortening appears. This is caused by optical proximity effect. The effect is mainly due to light intensity spread in a laser beam which causes the spread of photon energy in resist layer. A new pre-compensation method has been developed to correct the optical proximity effect. The method has been implemented in the ISI-2802 laser direct write system. Feature size down to 0.6 μm has been produced with the system which normally can only produce 1 μm lithography without proximity correction.

Type

Journal article

Journal

Proceedings of SPIE - The International Society for Optical Engineering

Publication Date

01/01/1999

Volume

3679

Pages

686 - 690