Fabrication of terahertz metamaterials using S1813/LOR stack by lift-off
Xia X., Yang H., Sun Y., Wang Z., Wang L., Cui Z., Gu C.
A novel micro-fabrication process for terahertz (THz) metamaterials (MMs) has been developed using S1813/LOR bi-layer stack. Desirable undercut resist profiles were created to assist lift-off process and to reduce defect level, which are frequently encountered in conventional single layer photoresist process. A series of experiments has been carried out to investigate the process conditions in order to achieve controllable undercut profiles in S1813/LOR bi-layer stack using a standard alkaline developer CD26. With the new bi-layer resist process, a large area THz MMs with high quality was fabricated and characterized by a terahertz time domain spectroscopy (THz-TDS). © 2008 Elsevier B.V. All rights reserved.