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This paper reports a recently developed nanofabrication process for the fabrication of vertical nanocontacts in ferromagnetic film, combining electron beam lithography and reactive ion etch. Dry etch for nanopinholes in SiNx layer has been studied. As small as 20 nm contacts have been achieved. The developed nanoprocess is not only applicable for such kind of spintronic devices, but also suitable for general nanoelectronic devices. © 2007 Elsevier B.V. All rights reserved.

Original publication

DOI

10.1016/j.mee.2007.12.027

Type

Journal article

Journal

Microelectronic Engineering

Publication Date

01/05/2008

Volume

85

Pages

1152 - 1156