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In this paper, we present a new method to improve the image quality and resolution of photolithography by filtering in fractional Fourier domain. Introducing a filter into fractional Fourier domain can not only increase the flexibility of the filtering operation, but also enhance the image quality and the depth of focus in photolithography. The corresponding simulation results are illustrated.

Original publication

DOI

10.1117/12.462880

Type

Journal article

Journal

Proceedings of SPIE - The International Society for Optical Engineering

Publication Date

01/01/2002

Volume

4755

Pages

755 - 759