Optical proximity correction in laser direct writing
Du J., Huang Q., Yao J., Zhang Y., Guo Y., Qiu C., Cui Z.
Proximity effect is an important factor which limits optical lithography resolution, and it also limits the applications of laser direct writing system in submicron and half-submicron optical lithography. The production mechanism of proximity effect in laser direct writing was analyzed, and its differences with projection optical lithography and electron beam lithography were described. A convenient and effective optical proximity correction method was presented.