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Proximity effect is an important factor which limits optical lithography resolution, and it also limits the applications of laser direct writing system in submicron and half-submicron optical lithography. The production mechanism of proximity effect in laser direct writing was analyzed, and its differences with projection optical lithography and electron beam lithography were described. A convenient and effective optical proximity correction method was presented.

Type

Journal article

Journal

Guangxue Xuebao/Acta Optica Sinica

Publication Date

01/07/1999

Volume

19

Pages

953 - 957