Cookies on this website
We use cookies to ensure that we give you the best experience on our website. If you click 'Continue' we'll assume that you are happy to receive all cookies and you won't see this message again. Click 'Find out more' for information on how to change your cookie settings.

A new method to fabricate hybrid micro-optical elements in one-step lithography is proposed in this paper. A gray-tone coding method has been developed to achieve one step photolithography of achromatic hybrid micro-optical elements. Design and simulation of hybrid lens with grey-tone mask are presented. The aberrations of optical elements are pre-corrected in the lithography process. The operating range of the hybrid optical element is in infrared band (8.0∼12.0 μm) with the central wavelength at 10.6 μm. © 2001 Elsevier Science B.V. All rights reserved.

Original publication

DOI

10.1016/S0167-9317(01)00493-2

Type

Journal article

Journal

Microelectronic Engineering

Publication Date

01/01/2001

Volume

57-58

Pages

793 - 799