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A new method to fabricate hybrid micro-optical elements in one-step lithography is proposed in this paper. A gray-tone coding method has been developed to achieve one step photolithography of achromatic hybrid micro-optical elements. Design and simulation of hybrid lens with grey-tone mask are presented. The aberrations of optical elements are pre-corrected in the lithography process. The operating range of the hybrid optical element is in infrared band (8.0∼12.0 μm) with the central wavelength at 10.6 μm. © 2001 Elsevier Science B.V. All rights reserved.

Original publication




Journal article


Microelectronic Engineering

Publication Date





793 - 799